Formation of PIn defect in annealed liquid-encapsulated Czochralski InP

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‏‎suppression of coke formation in thermal cracking by coke inhibitors‎‏

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Effect of Stress on Creation of Defects in Annealed Czochralski Grown Silicon

The effect of stress (exerted by hydrostatic pressure of argon ambient enhanced up to 1.2 GPa) on the creation of oxygen-related defects in annealed Czochralski grown silicon (Cz-Si) was investigated. Concentrations of oxygen interstitials and of dislocations in Cz-Si samples with before-created nucleation centres for oxygen precipitation were markedly lower after pressure treatment at 1120 to ...

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ژورنال

عنوان ژورنال: Applied Physics Letters

سال: 1998

ISSN: 0003-6951,1077-3118

DOI: 10.1063/1.121297